Nitrogen trifluoride at room temperature is a colorless, odorless, stable gas, is a strong oxidant.
Nitrogen trifluoride in the microelectronics industry as an excellent plasma etching gas,
etching is cleaved at the ion-active fluorine ions, fluoride ions which silicon and tungsten compounds,
high purity nitrogen trifluoride having excellent etching rate and selection property (for silicon oxide and silicon),
which at the time of etching, the etching surface without leaving any residue, the cleaning agent is very good,
while in the chip manufacturing, high energy lasers have been a lot of use.